Photomask and next-generation lithography mask technology XVII (13-15 April 2010, Yokohama, Japan)Hosono, Kunihiro.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7748, issn 0277-786X, isbn 0-8194-8238-2 978-0-8194-8238-9, 1Vol, various pagings, isbn 0-8194-8238-2 978-0-8194-8238-9Conference Proceedings

Photomask and next-generation lithography mask technology XVI (8-10 April 2009, Yokohama, Japan)Hosono, Kunihiro.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, various pagings, isbn 978-0-8194-7656-2 0-8194-7656-0Conference Proceedings

Future Application of e-Beam Repair Tool Beyond 3X GenerationKANAMITSU, Shingo; HIRANO, Takashi.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7748, issn 0277-786X, isbn 0-8194-8238-2 978-0-8194-8238-9, 1Vol, 77481J.1-77481J.9Conference Paper

Multi-Core Advantages for Mask Data PreparationYEAP, Johnny; NOGATCH, John.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 73790Y.1-73790Y.7Conference Paper

Evolution of etch profile and CD variation in maskmaking and SPT: simulations using TRAVIT softwareBABIN, Sergey; BAY, Konstantin.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7748, issn 0277-786X, isbn 0-8194-8238-2 978-0-8194-8238-9, 1Vol, 774813.1-774813.7Conference Paper

Perspectives of CMOS Technology and Future RequirementsMOGAMI, Tohru.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7748, issn 0277-786X, isbn 0-8194-8238-2 978-0-8194-8238-9, 1Vol, 774802.1-774802.9Conference Paper

Assessing Equipment and Process Related Electrostatic Risks to Reticles with E-Reticle^™ SystemTU, Richard; SEBALD, Thomas.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7748, issn 0277-786X, isbn 0-8194-8238-2 978-0-8194-8238-9, 1Vol, 77481C.1-77481C.10Conference Paper

Economics of Automation for the Design-to-Mask InterfaceERCK, Wesley.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 73790U.1-73790U.10Conference Paper

High sensitivity electric field monitoring system for control of field-induced CD degradation in reticles (EFM)SEBALD, Thomas; RIDER, Gavin.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 73791P.1-7379P.10Conference Paper

Litho/mask strategies for 32-nm half-pitch and beyond: Using established and adventurous tools/technologies to improve cost and imaging performanceLIN, Bum J.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 737902.1-737902.11Conference Paper

The Fusion of Metrology and Inspection: Challenges and SolutionsHIGUCHI, Masaru.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7748, issn 0277-786X, isbn 0-8194-8238-2 978-0-8194-8238-9, 1Vol, 77480K.1-77480K.10Conference Paper

Smart Way to Determine and Guarantee Mask Specifications: Trade-off between Cost and QualitySHIGEMITSU, Fumiaki.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 73790T.1-73790T.14Conference Paper

Preserving the mask integrity for the lithography processSINGH, Sherjang; DRESS, Peter; DIETZE, Uwe et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7748, issn 0277-786X, isbn 0-8194-8238-2 978-0-8194-8238-9, 1Vol, 77480E.1-77480E.7Conference Paper

Novel Absorber Material for EUV Lithography MaskMATSUO, Tadashi; KANAYAMA, Koichiro; OKUMOTO, Yasuhiro et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 7379G.1-7379G.8Conference Paper

The Art of Photomask Materials for Low-k1-193nm-LithographyHASHIMOTO, Masahiro; IWASHITA, Hiroyuki; MITSUI, Hideaki et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 73791Q.1-73791Q.8Conference Paper

Evaluation of metrology capabilities of mask inspection equipmentTOUYA, T; TAMAMUSHI, S; TAKAMATSU, N et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7748, issn 0277-786X, isbn 0-8194-8238-2 978-0-8194-8238-9, 1Vol, 77480O.1-77480O.11Conference Paper

Extension of Optical Lithography by Mask-Litho Integration with Computational LithographyTAKIGAWA, T; GRONLUND, K; WILEY, J et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7748, issn 0277-786X, isbn 0-8194-8238-2 978-0-8194-8238-9, 1Vol, 77480R.1-77480R.11Conference Paper

Present Status of Multi Column Cell Exposure System for Mask WritingYASUDA, Hiroshi; YAMADA, Akio; YAMABE, Masaki et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 737918.1-737918.7Conference Paper

A noble evaluation method for repaired area utilizing SEM imagesMORISHITA, Keiko; KANAMITSU, Shingo; HIRANO, Takashi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 73792C.1-7379C.8Conference Paper

Implications of image plane line-edge roughness requirements on extreme ultraviolet mask specificationsNAULLEAU, Patrick P; GEORGE, Simi A.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 73790O.1-73790O.11Conference Paper

Inspecting EUV mask blanks with a 193-nm systemGLASSER, Joshua; STOKOWSKI, Stan; INDERHEES, Gregg et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7748, issn 0277-786X, isbn 0-8194-8238-2 978-0-8194-8238-9, 1Vol, 774808.1-774808.11Conference Paper

Semi-Automated Repair Verification of Aerial ImagesPOORTINGA, Eric; SCHERUEBL, Thomas; RICHTER, Rigo et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 73792D.1-7379D.7Conference Paper

Extraction and utilization of the repeating patterns for CP writing in mask makingSHOJI, Masahiro; INOUE, Tadao; YAMABE, Masaki et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7748, issn 0277-786X, isbn 0-8194-8238-2 978-0-8194-8238-9, 1Vol, 77480Y.1-77480Y.10Conference Paper

Reduction of resist charging effect by EB reticle writer EBM-7000SAITO, Masato; UGAJIN, Kunihiro; IKENAGA, Osamu et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 73791A.1-73791A.8Conference Paper

The study of defect detection method for 32nm technology node and beyondSEKI, Kazunori; SHIBITA, Masafumi; AKIMA, Shinji et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 737928.1-737928.12Conference Paper